Last updated: 25/12/2018

Growth Facilities
    UHV MBE/sputter
    HiTUS

Nanofabrication
    e-beam lithography
    Photolithography
    FIB
    Cleanroom

Characterisation
    Probe station
    XRD
    GHz pulse measurement
    Dilution refrigerator
    VSM
    AGFM
    MR prober
    Annealing furnace
    MOKE
    HRTEM/STEM
    TEM
    SEM
    SPM
    Sample preparation
    Particle analyser

Focused Ion Beam (FIB)

JEOL JSM-7000Fabrika

FIB
This FIB system is made by JEOL and have the following capabilities:
  • Acceleration voltage: 0.5 ~ 30 kV
  • Resolution: < 1.2 nm
  • Magnification: & times; 10 ~ 500,000
  • Orsay Physics Canion 31+ Ion Beam column
  • 5 Gas Injectors
  • Xenos XEdraw Lithography Package
This system belongs to York JEOL Nanocentre directed by Profs. Pratibha Gai and Ed Boyes. See more details on their page.