Last updated: 25/12/2018

Growth Facilities
    UHV MBE/sputter
    HiTUS

Nanofabrication
    e-beam lithography
    Photolithography
    FIB
    Cleanroom

Characterisation
    Probe station
    XRD
    GHz pulse measurement
    Dilution refrigerator
    VSM
    AGFM
    MR prober
    Annealing furnace
    MOKE
    HRTEM/STEM
    TEM
    SEM
    SPM
    Sample preparation
    Particle analyser

Hi Target Utilisation Sputtering System

Plasma Quest HiTUS

HiTUS
This sputtering system is made by Plasma Quest and have the following capabilities:
  • Base pressure: < 3×10-5 Pa
  • Sputtering pressure: 3×10-1 Pa
  • rf plasma steering bias: -100 ~ -990 V
  • Sputtering targets: 8×2" targets
  • Substrate holder: 6 positions
  • Substrate temperature: room temperature ~ 300 °C
This system belongs to Magnetic Materials Group led by Prof. Kevin O'Grady at the Department of Physics.