Last updated: 25/12/2018

Growth Facilities
    UHV MBE/sputter
    HiTUS

Nanofabrication
    e-beam lithography
    Photolithography
    FIB
    Cleanroom

Characterisation
    Probe station
    XRD
    GHz pulse measurement
    Dilution refrigerator
    VSM
    AGFM
    MR prober
    Annealing furnace
    MOKE
    HRTEM/STEM
    TEM
    SEM
    SPM
    Sample preparation
    Particle analyser

UHV MBE/Sputtering System

Eiko HDH-10000

MBE
This magnetic ultrathin film deposition system is made by Eiko Engineering and consists of the main chamber:
  • Base pressure: < 1×10-8 Pa
  • Turbo molecular pump, ion pump and titanium sublication pump
  • Water-cooled jacket
  • Electron-guns: 3 kW × 2 (2 cc crucible × 5 for each)
  • K-cell: 40 cc PBN < 1300 °C
  • Substrate size: < 1" square
  • Substrate temperature: -50 ~ 800 °C
  • Substrate tilting: ± 20 °
  • In-situ mask and linear shutter: 3 masks
  • In-situ analysis: RHEED (30 kV gun)
  • 3 independent thickness monitor for 2 e-guns and K-cell
and the load-lock:
  • Base pressure: ~ 10-7 Pa
  • Turbo molecular pump
  • DC sputter: 1 kW power supply with 2" target
This system was purchased by JST-PRESTO grant for the development of a nano-spin motor.