The equipment allows the in-situ characterisation of surface structure, chemical and magnetic properties of samples as they are grown. The substrate can be heated up to 1200 C during deposition.

Samples can be processed using the clean room facilities here in York and a new SEM means e-beam lithography is possible. This allows wet and plasma etching, photolithography, wire bonding and thickness calibration. In addition, samples can also be processed in facilities run by our our collaborators, such as Ion beam etching at Oxford. We can also characterise samples grown at other institutions, such as Daresbury, Cornell University, Paris and the Goddard Space Centre (NASA).