E-Beam Lithography

JEOL JBX-6300FS

This system is under construction by JEOL and is planned to be installed in the University of Leeds by the end of June 2011. Our group has 25% of the quota with a dedicated experimental officer to be appointed. This system satisfies the following capabilities:

Acceleration voltage: 25, 50 & 100 kV
Electon gun: ZrO/W Schottky
Electron-beam: < 2 nm in diameter
Wafer handling: 10 wafer loader (5 mm square ~ 4" wafer)
Overlay accuracy: < ± 20 nm
Stitching accuracy: < ± 20 nm
Minimum feature: < 10 nm

Example of a rosette cinsisting of 10 nm wide metallic wire.

This system was purchased by EPSRC critical mass grant.

Professor Atsufumi Hirohata (Professor in Nanoelectronics, Principal Investigator)
Department of Electronic Engineering, University of York, Heslington, York YO10 5DD, England
Phone: +44 (0)1904 323 245 | Fax: +44 (0)1904 322 335 | E-mail: atsufumi.hirohata @ york.ac.uk

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Department of Electronic Engineering

Quantum Nanoelectronics | Spintronics and Nanodevices

E-Beam Lithography

JEOL JBX-6300FS