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Last updated: 11/09/2019

Eiko HDH-10000

This magnetic ultrathin film deposition system is made by Eiko Engineering and consists of the main chamber:

• Base pressure: < 1×10^-8 Pa
• Turbo molecular pump, ion pump and titanium sublication pump
• Water-cooled jacket
• Electron-guns: 3 kW × 2 (2 cc crucible × 5 for each)
• K-cell: 40 cc PBN < 1300 °C
• Substrate size: < 1" square
• Substrate temperature: -50 ~ 800 °C
• Substrate tilting: ± 20 °
• In-situ mask and linear shutter: 3 masks
• In-situ analysis: RHEED (30 kV gun)
• 3 independent thickness monitor for 2 e-guns and K-cell

and the load-lock:

• Base pressure: ~ 10^-7 Pa
• Turbo molecular pump
• DC sputter: 1 kW power supply with 2" target

This system was purchased by JST-PRESTO grant for the development of a nano-spin motor.