Last updated: 25/12/2018

Growth Facilities
    UHV MBE/sputter
    HiTUS

Nanofabrication
    e-beam lithography
    Photolithography
    FIB
    Cleanroom

Characterisation
    Probe station
    XRD
    GHz pulse measurement
    Dilution refrigerator
    VSM
    AGFM
    MR prober
    Annealing furnace
    MOKE
    HRTEM/STEM
    TEM
    SEM
    SPM
    Sample preparation
    Particle analyser

Photolithography

Süss MicroTec MA6

Photolithography
This photolithography is made by Süss MicroTec and has the following capabilities:
  • Light source: 350 W Hg lamp
  • Wafer: < 6" in dieameter
  • Wafer thickness: < 4.5 mm
  • Exposure modes: vacuum, hard & soft contact
  • Minimum feature: < 1 μm
This system was purchased by the Departmental Strategic Fund.